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duv和euv技术区别
更新时间： 2021-11-22 19:27:41  

DUV是深紫外线（Deep Ultraviolet Lithography），EUV是极深紫外线（Extreme Ultraviolet Lithography）。从制程范围来看，DUV基本上只能做到25nm，Intel凭借双工作台的模式做到了10nm，但是却无法达到10nm以下。只有EUV能满足10nm以下的晶圆制造，并且还可以向5nm、3nm继续延伸。

关键词： duv euv 技术 区别

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